RF Power Supply for PECVD

Sales RF Power Supply for PECVD

Sales Manager: Andrea

Email: Andrea@tmaxlaboratory.com

Wechat: 18250801164

  • Warranty : Two years limited warranty with lifetime technical support
  • Certificate : CE, IOS, ROHS, SGS, UL Certificate

Product Detail  


RF Power Supply for PECVD




The PECVD system consists of a tube furnace, a quartz vacuum chamber, a vacuum system, a gas supply system, and a radio frequency power supply system. Mainly used for: growth of metal thin films, ceramic thin films, composite thin films, graphene, etc. It is easy to add functions, and can expand functions such as plasma cleaning and etching. The PECVD system has the advantages of high film deposition rate, good uniformity, high consistency and stability.


 Main technical parameters of RF power supply:

Power output range

  0-500W

Maximum reflected power

 200W

working frequency

RF:13.56MHZ±0.005%

Power stability

 +/-0.1%

Harmonic component

≤-50dbc

Rf region width

0-600mmadjustable

Matching way

automatic

Cooling mode

Points of cold

 Noise

 <50dB

 Radio frequency interface

 50Ω   N-type

Input power

 208-240V  50/60HZ

RF Power Supply

 Tmax CE

 TMAX Partner

CVD furnace


tube furnace


muffle furnace



1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

3 Responsible for the damage during the shipping process, will change the damage part for you for free.



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